Correction: Modelling focused electron beam induced deposition beyond Langmuir adsorption

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Modelling focused electron beam induced deposition beyond Langmuir adsorption

In this work, the continuum model for focused electron beam induced deposition (FEBID) is generalized to account for multilayer adsorption processes. Two types of adsorption energies, describing both physisorption and spontaneous chemisorption, are included. Steady state solutions under no diffusion are investigated and compared under a wide range of conditions. The different growth regimes obs...

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BACKGROUND Focused electron beam induced deposition (FEBID) is a direct-writing technique with nanometer resolution, which has received strongly increasing attention within the last decade. In FEBID a precursor previously adsorbed on a substrate surface is dissociated in the focus of an electron beam. After 20 years of continuous development FEBID has reached a stage at which this technique is ...

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Focused electron beam induced deposition (FEBID) is a direct beam writing technique for nanoand micro-structures. By proper selection of the precursor gas, which is dissociated in the focus of the electron beam, different functionalities of the resulting deposits can be obtained. This contribution discusses nano-granular FEBID materials. Quite generally, nano-granular metals can be considered a...

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ژورنال

عنوان ژورنال: Beilstein Journal of Nanotechnology

سال: 2017

ISSN: 2190-4286

DOI: 10.3762/bjnano.8.259